Paper
5 October 2005 Optical and mechanical properties of thin RLVIP Nb2O5-films
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Abstract
Thin Nb2O5-films were deposited on unheated glass, fused silica, and silicon substrates by reactive-low-voltage-high-current-ion-plating (RLVIP). Optical as well as mechanical film properties and their environmental stability are remarkably influenced by deposition parameters like e. g. arc current, deposition rate, gas composition, and total gas pressure. It was found out that an arc current around 50A, gas mixtures with high amount of oxygen, and a deposition rate around 0,3nm/s yielded the best results. Refractive indices were calculated from data obtained by spectrophotometric intensity measurements of the constrained amorphous and homogeneous films. Residual optical absorption in the film's high transmittance range was determined by photothermal deflection spectrometry. Mechanical film stress, for dense films always compressive, was measured by deformation of coated thin silicon discs. Typical obtained values are n550 = 2,39 - 2,40, k515 = 2×10-4, σ = -30MPa. Detailed information is presented in diagrams.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Hallbauer, D. Huber, and H. K. Pulker "Optical and mechanical properties of thin RLVIP Nb2O5-films", Proc. SPIE 5963, Advances in Optical Thin Films II, 59631F (5 October 2005); https://doi.org/10.1117/12.624851
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KEYWORDS
Oxygen

Absorption

Refractive index

Niobium

Particles

Ions

Argon

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