Micro-optics: manufacturing and characterization

R. Voelkel; M. Eisner; K. J. Weible

doi:10.1117/12.624133

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13 October 2005 Micro-optics: manufacturing and characterization

R. Voelkel, M. Eisner, K. J. Weible

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Proceedings Volume 5965, Optical Fabrication, Testing, and Metrology II; 596501 (2005) https://doi.org/10.1117/12.624133
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

Wafer-based manufacturing of Micro-Optics is based on standard technologies from Semiconductor Industry, like resist coating, lithography, reactive ion etching, deposition, sputtering, and lift-off. These well-established technologies allow the manufacturing of almost any Micro-Optics' structure shape. The excellence of the Micro-Optics component depends much on the proper choice of the manufacturing equipment and the process control. As all processes are standard Semiconductor technology, the quality is merely a question of the budget and the optimization effort. For characterization and testing, the current situation is different. Neither the test equipment from Semiconductor industry nor the test equipment from classical optics manufacturing is suitable to for Micro-Optics. Most of test instruments Micro-Optics industry is using today have been developed by research institutes or by the manufacturing companies themselves. As Micro-Optics is still a niche market, all instruments are built in small series. This lack of suitable test equipment is a major problem for the Micro-Optics industry today. All process optimization in manufacturing is closely related to the capability to measure the quality of the products. We report on the state of the art in wafer-based manufacturing and summarize the standard characterization tools for Micro-Optics.

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R. Voelkel, M. Eisner, and K. J. Weible "Micro-optics: manufacturing and characterization", Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 596501 (13 October 2005); https://doi.org/10.1117/12.624133

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