Ellipsometry of scattering patterns from optical inhomogeneities

Carole Deumié; Gaelle Georges; Olivier Gilbert; Claude Amra

doi:10.1117/12.625201

19 October 2005 Ellipsometry of scattering patterns from optical inhomogeneities

Carole Deumié, Gaelle Georges, Olivier Gilbert, Claude Amra

Proceedings Volume 5965, Optical Fabrication, Testing, and Metrology II; 59651C (2005) https://doi.org/10.1117/12.625201
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

The validity of the Ellipsometry of Angular Resolved Scattering technique introduced in a well known scatterometer has been demonstrated. The results were applied to the separation of surface and bulk effects in low-loss samples, because first-order scattering only depends on the origin of scattering, not on the topography or microstructure. The major point that we address is then the generalization of the separation technique (surface or bulk) to arbitrary heterogeneous samples with high level diffuse reflectance. The problem is strongly different since phase data from these samples depend on microstructure, not only on the physical origin of scattering.

Citation Download Citation

Carole Deumié, Gaelle Georges, Olivier Gilbert, and Claude Amra "Ellipsometry of scattering patterns from optical inhomogeneities", Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59651C (19 October 2005); https://doi.org/10.1117/12.625201

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