Self-organized antireflective nanostructures on PMMA by ion etching

A. Kaless; U. Schulz; N. Kaiser

doi:10.1117/12.623547

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19 October 2005 Self-organized antireflective nanostructures on PMMA by ion etching

A. Kaless, U. Schulz, N. Kaiser

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Proceedings Volume 5965, Optical Fabrication, Testing, and Metrology II; 59651N (2005) https://doi.org/10.1117/12.623547
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

Stochastic, self-organized nanostructures are produced by a low-pressure plasma treatment on the polymer polymethylmetacrylate (PMMA). The phenomena obtained by plasma treatment (structure formation and antireflective effect) are investigated regarding surface modifications, structure growth, and chemical modifications. Optically, the structure acts like a gradient layer with decreasing effective refractive index towards air, which is suitable for antireflection of PMMA.

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A. Kaless, U. Schulz, and N. Kaiser "Self-organized antireflective nanostructures on PMMA by ion etching", Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59651N (19 October 2005); https://doi.org/10.1117/12.623547

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