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19 October 2005 Off axis microspectrophotometer for optical coating characterization on complex surfaces
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Optical thin films, especially reflection reducing coatings, are often applied to complex surfaces, e.g. small and strongly curved optical elements that are built into optical devices like object lenses for microscopes. The performance of the device depends very much on the optical quality throughout the entire surface of the optical element. In order to measure optical parameters in defined positions of a given optical surface, a fully automated microspectrophotometer for in line quality control was developed. The microspectrophotometer consists of a Zeiss MCS 501 diode array spectrometer that is capable of fast and simultaneous data acquisition over the desired spectrum between NUV and NIR, connected via light waveguide to a Zeiss Axiostar microscope, which is operated in the reflected-light-brightfield mode, and a sample handling system that can be programmed to measure any spot on the individual surface of the optical element under examination. The size of the measured spot is in the order of about ten micrometers in diameter, allowing also characterization of defects and microscopic deviations from the desired thin film coating or optical surface. The principle and the assembly of the microspectrophotometer are presented as well as measurements of uniformity distributions of antireflection coatings on small semispheres achieved by different coating processes.
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Hansjörg Niederwald, Lothar Deisenroth, and Sebastian Nunnendorf "Off axis microspectrophotometer for optical coating characterization on complex surfaces", Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59651S (19 October 2005);

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