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7 February 2006 Thin-film design for multilayer diffraction gratings
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Multilayer dielectric (MLD) diffraction gratings are a key component for the construction of high-peak-power, pulse-compressed laser systems. While a great deal of effort has been devoted to the design of optimal grating structures and the etching of these structures into the MLD coating, there has not been the same effort put into the optimization of the MLD coating itself. The primary characteristics of the multilayer that must be considered during design include minimization of the standing wave created in the photoresist because of the reflectivity of the coated optical surface, creation of a sufficiently high reflectivity at the use wavelength and incidence angle in a dry environment, proper balance of the individual layer materials to yield a coating with an overall neutral or slightly compressive stress, and a high laser-damage threshold for the wavelength and pulse duration of use. This work focuses on the modification of a standard MLD mirror, while considering these characteristics, to allow the fabrication of a diffraction grating with higher efficiency and laser-damage threshold than is typically achieved. Scanning electron microscopy (SEM) images of the grating structures demonstrate smoother shapes with lower roughness due to the holographic exposure. Damage testing performed at 1053 nm with a pulse width of 10 ps demonstrates the MLD coating has a sufficiently high laser-damage threshold to form the basis of reflection gratings that survive in high-fluence applications.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J.B. Oliver, T.J. Kessler, H. Huang, J. Keck, A.L. Rigatti, A.W. Schmid, A. Kozlov, and T.Z. Kosc "Thin-film design for multilayer diffraction gratings", Proc. SPIE 5991, Laser-Induced Damage in Optical Materials: 2005, 59911A (7 February 2006);

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