Benchmark of FEM, waveguide, and FDTD algorithms for rigorous mask simulation

Sven Burger; Roderick Köhle; Lin Zschiedrich; Weimin Gao; Frank Schmidt; Reinhard März; Christoph Nölscher

doi:10.1117/12.631696

4 November 2005 Benchmark of FEM, waveguide, and FDTD algorithms for rigorous mask simulation

Sven Burger, Roderick Köhle, Lin Zschiedrich, Weimin Gao, Frank Schmidt, Reinhard März, Christoph Nölscher

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 599216 (2005) https://doi.org/10.1117/12.631696
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

An extremely fast time-harmonic finite element solver developed for the transmission analysis of photonic crystals was applied to mask simulation problems. The applicability was proven by examining a set of typical problems and by a benchmarking against two established methods (FDTD and a differential method) and an analytical example. The new finite element approach was up to 100 times faster than the competing approaches for moderate target accuracies, and it was the only method which allowed to reach high target accuracies.

Citation Download Citation

Sven Burger, Roderick Köhle, Lin Zschiedrich, Weimin Gao, Frank Schmidt, Reinhard März, and Christoph Nölscher "Benchmark of FEM, waveguide, and FDTD algorithms for rigorous mask simulation", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599216 (4 November 2005); https://doi.org/10.1117/12.631696

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