Mask cleaning strategies: haze elimination

Steve Osborne; Matthias Nanninga; Hidekazu Takahashi; Eric Woster

doi:10.1117/12.632179

8 November 2005 Mask cleaning strategies: haze elimination

Steve Osborne, Matthias Nanninga, Hidekazu Takahashi, Eric Woster

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59923H (2005) https://doi.org/10.1117/12.632179
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

A great deal of work has been done on identifying the sources of reticle haze. Researchers have sited haze contributions from the atmosphere, from pellicle, pellicle adhesive and from sulfate residuals left by mask cleaning. Residual sulfates from otherwise high performance cleaning processes can range from 30 ppb and up. This paper focuses on final clean methods within a single track tool that leave concentrations of ion residues approaching 1 ppb. We compare different spin processes which use ozonated water and ultra dilute ammonia and hydrogen water through a megasonic head. Other sources of haze producing ions may remain but eliminating contributions from the final cleaning process opens a productive path to higher yield with 65 and 45 nm design rules.

Citation Download Citation

Steve Osborne, Matthias Nanninga, Hidekazu Takahashi, and Eric Woster "Mask cleaning strategies: haze elimination", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59923H (8 November 2005); https://doi.org/10.1117/12.632179

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