Development of an actinic photomask review and phase metrology tool for 193-nm lithography

Andrew J. Merriam; James J. Jacob

doi:10.1117/12.632309

8 November 2005 Development of an actinic photomask review and phase metrology tool for 193-nm lithography

Andrew J. Merriam, James J. Jacob

Author Affiliations +

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59924J (2005) https://doi.org/10.1117/12.632309
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

We describe an improved solid-state 193-nm laser source tailored specifically for high resolution photomask phase metrology. This source operates at a repetition rate of 5 kHz and produces 10-mW average power with a spectral bandwidth of 30 pm and near-TEM₀₀ mode quality. The enhanced optical performance results from an optical parametric oscillator of improved design, and the use of the nonlinear crystal cesium-lithium-borate for fourth-harmonic generation. We also discuss the design evolution of our photomask phase metrology tool. The use of actinic illumination facilitates imaging of photomask phase structures, and ensures that optical path difference measurements and printing simulations are performed in-band and without off-wavelength accuracy errors.

Citation Download Citation

Andrew J. Merriam and James J. Jacob "Development of an actinic photomask review and phase metrology tool for 193-nm lithography", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59924J (8 November 2005); https://doi.org/10.1117/12.632309

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