Image placement accuracy of single-membrane stencil masks for e-beam lithography

Minoru Kitada; Satoshi Yusa; Naoko Kuwahara; Hiroshi Fujita; Tadahiko Takikawa; Hisatake Sano; Morihisa Hoga

doi:10.1117/12.630114

8 November 2005 Image placement accuracy of single-membrane stencil masks for e-beam lithography

Minoru Kitada, Satoshi Yusa, Naoko Kuwahara, Hiroshi Fujita, Tadahiko Takikawa, Hisatake Sano, Morihisa Hoga

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59924R (2005) https://doi.org/10.1117/12.630114
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

Three stencil masks with simple die layouts on 24 mm x 24 mm Si membranes are made to compare simulation and experiment on image placement (IP). A pseudo finite element (FE) modeling is adopted. Displacements predicted by simulation are found to be smaller than experimental values, but both agree qualitatively. Four stencil masks with die layouts that model on ULSI hole layers in 30% opening ratio and pattern arrangement are successfully made. Displacements are reduced to 1/4 by adopting IP correction. The IP correction of EB data is found to be a useful method of reducing IP error.

Citation Download Citation

Minoru Kitada, Satoshi Yusa, Naoko Kuwahara, Hiroshi Fujita, Tadahiko Takikawa, Hisatake Sano, and Morihisa Hoga "Image placement accuracy of single-membrane stencil masks for e-beam lithography", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59924R (8 November 2005); https://doi.org/10.1117/12.630114

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