Photoelectrochemical Etching Of Holographic Gratings In Semiconductors And Applications

J. Ph. Schnell; V. Martin; P. Nyeki; B. Loiseaux; G. Illiaquer; J. P. Huignard

doi:10.1117/12.952420

30 June 1986 Photoelectrochemical Etching Of Holographic Gratings In Semiconductors And Applications

J. Ph. Schnell, V. Martin, P. Nyeki, B. Loiseaux, G. Illiaquer, J. P. Huignard

Proceedings Volume 0600, Progress in Holographic Applications; (1986) https://doi.org/10.1117/12.952420
Event: 1985 International Technical Symposium/Europe, 1985, Cannes, France

Abstract

We describe and analyse the use of the photoelectrochemical etching technique to create holographic relief gratings and patterns in semiconductors such as GaAs. Images and wavefront diffracted in the visible and the I.R. will be shown.

Citation Download Citation

J. Ph. Schnell, V. Martin, P. Nyeki, B. Loiseaux, G. Illiaquer, and J. P. Huignard "Photoelectrochemical Etching Of Holographic Gratings In Semiconductors And Applications", Proc. SPIE 0600, Progress in Holographic Applications, (30 June 1986); https://doi.org/10.1117/12.952420

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