Paper
10 November 2005 Fabrication of extreme aspect ratio wires within photonic crystal fibers
J. V. Badding, P. J. A. Sazio, A. Amezcua Correa, T. J. Scheidemantel, C. E. Finlayson, N. F. Baril, D.-J. Won, H. Fang, B. Jackson, A. Borhan, V. Gopalan
Author Affiliations +
Abstract
We have recently fabricated continuous semiconducting micro and nanowires within the empty spaces of highly ordered microstructured (e.g., photonic crystal or holey) optical fibers (MOF's). These systems contain the highest aspect ratio semiconductor micro- and nanowires yet produced by any method: centimeters long and ~100 nm in diameter. These structures combine the flexible light guiding capabilities of an optical fiber with the electronic and optical functionalities of semiconductors and have many potential applications for in-fiber sensing, including in-fiber detection, modulation, and generation of light.
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J. V. Badding, P. J. A. Sazio, A. Amezcua Correa, T. J. Scheidemantel, C. E. Finlayson, N. F. Baril, D.-J. Won, H. Fang, B. Jackson, A. Borhan, and V. Gopalan "Fabrication of extreme aspect ratio wires within photonic crystal fibers", Proc. SPIE 6005, Photonic Crystals and Photonic Crystal Fibers for Sensing Applications, 60050I (10 November 2005); https://doi.org/10.1117/12.632675
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KEYWORDS
Micro optical fluidics

Silicon

Semiconductors

Capillaries

Germanium

Optical fibers

Deposition processes

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