Photolithographically controlled emission from photonic crystals

Irina Puscasu; Martin Pralle; Mark McNeal; Anton Greenwald; Ed Johnson; Ashish A. Shah

doi:10.1117/12.630900

17 November 2005 Photolithographically controlled emission from photonic crystals

Irina Puscasu, Martin Pralle, Mark McNeal, Anton Greenwald, Ed Johnson, Ashish A. Shah

Proceedings Volume 6008, Nanosensing: Materials and Devices II; 60080Y (2005) https://doi.org/10.1117/12.630900
Event: Optics East 2005, 2005, Boston, MA, United States

Abstract

Ion Optics has developed a thin silicon membrane MEMS device that replaces the thermal source, IR filter, IR detector and mechanical chopper in conventional non-dispersive infrared gas sensors. The key enabling technology is a 2-D photonic crystal. The center wavelength and bandwidth of emitted radiation from the photonic crystal depends upon the pattern etched into the surface. Previously we reported designs based on hexagonal arrangements of holes about 2 microns diameter. New results for more intricate designs with deliberate photonic crystal "defects" will be presented. Experimental results will be compared to 3-D electromagnetic models. The 2-D photonic crystal structure consists of an array of air rods produced by self-aligned etching into a thin (100nm) conductor on top of a dielectric membrane. We describe fabrication routes via conventional silicon microlithography and novel approaches including nano-imprinting and transfer molding. We present spectral emission and absorption measurements which relate optical intensity to details of photonic crystal design and fabrication.

Citation Download Citation

Irina Puscasu, Martin Pralle, Mark McNeal, Anton Greenwald, Ed Johnson, and Ashish A. Shah "Photolithographically controlled emission from photonic crystals", Proc. SPIE 6008, Nanosensing: Materials and Devices II, 60080Y (17 November 2005); https://doi.org/10.1117/12.630900

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