Paper
5 December 2005 High performance strain-compensated InGaAsN quantum-well ridge waveguide lasers
Author Affiliations +
Proceedings Volume 6020, Optoelectronic Materials and Devices for Optical Communications; 60200G (2005) https://doi.org/10.1117/12.634897
Event: Asia-Pacific Optical Communications, 2005, Shanghai, China
Abstract
High power InGaAsN triple-quantum-well strain-compensated lasers grown by metal organic chemical vapor deposition (MOCVD) were fabricated with pulsed anodic oxidation. A maximum light power output of 304 mW was obtained from a 10-μm stripe width uncoated laser diode in continuous wave (CW) mode at room temperature. The characteristic temperature of the lasers was 138 K.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yi Qu, Jing Zhang, Hui Li, Xin Gao, Baoxue Bo, J. X. Zhang, and A. Uddin "High performance strain-compensated InGaAsN quantum-well ridge waveguide lasers", Proc. SPIE 6020, Optoelectronic Materials and Devices for Optical Communications, 60200G (5 December 2005); https://doi.org/10.1117/12.634897
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KEYWORDS
Oxidation

Phased array optics

Semiconducting wafers

Continuous wave operation

Oxides

Gallium arsenide

Metalorganic chemical vapor deposition

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