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9 December 2005 Application of photoresist melting method to the fabrication of holographic grating
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Proceedings Volume 6024, ICO20: Optical Devices and Instruments; 60242A (2005)
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China
A new technique of reducing surface roughness of photoresist grating is presented. In this paper, photoresist melting method, which is low-cost, short-period and easy realization, is presented. In addition, the influence of photoresist melting on the groove profile of the photoresist grating is investigated. Experimental results show that the surface roughness reduces due to surface tension, when developed photoresist is heated to be melting state by this method. In experiment, when the melted photoresist grating is etched by ion beam, the surface relief grating possessing preferable groove profile is obtained on K9 glass substrate, then the surface is evaporated by aluminum using vacuum evaporation, holographic grating with preferable groove profile is successively fabricated.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wenhao Li, X. Bayanheshig, Chengshan Zhang, Jianxiang Gao, Hongzhu Yu, and Yuguo Tang "Application of photoresist melting method to the fabrication of holographic grating", Proc. SPIE 6024, ICO20: Optical Devices and Instruments, 60242A (9 December 2005);

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