Femtosecond laser pulse induced damage in thin films

Haiyi Sun; Tianqing Jia; Xiaoxi Li; Chengbin Li; Donghai Feng; Shizhen Xu; Zhizhan Xu

doi:10.1117/12.667187

23 December 2005 Femtosecond laser pulse induced damage in thin films

Haiyi Sun, Tianqing Jia, Xiaoxi Li, Chengbin Li, Donghai Feng, Shizhen Xu, Zhizhan Xu

Proceedings Volume 6028, ICO20: Lasers and Laser Technologies; 60281D (2005) https://doi.org/10.1117/12.667187
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China

Abstract

We have investigated the damage for ZrO₂/SiO₂ 800 nm 45° high-reflection mirror and MgF₂/ZnS 800 nm interference filter with femtosecond pulses. The damage morphologies and evolution of ablation crater depths with laser fluences are dramatically different from that with pulse longer than a few tens of picoseconds. We also report their single-short damage thresholds for pulse durations ranging from 50 fs to 900 fs, which depart from the diffusion-dominated τ^1/2 scaling. A developed avalanche model, including the production of conduction band electrons (CBE) and laser energy deposition, is applied to study the damage mechanisms. The theoretical results agree well with our measurements.

Citation Download Citation

Haiyi Sun, Tianqing Jia, Xiaoxi Li, Chengbin Li, Donghai Feng, Shizhen Xu, and Zhizhan Xu "Femtosecond laser pulse induced damage in thin films", Proc. SPIE 6028, ICO20: Lasers and Laser Technologies, 60281D (23 December 2005); https://doi.org/10.1117/12.667187

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