Paper
28 December 2005 Nano-explosions in porous silicon
Monuko du Plessis, Corrie Conradie
Author Affiliations +
Proceedings Volume 6037, Device and Process Technologies for Microelectronics, MEMS, and Photonics IV; 60370X (2005) https://doi.org/10.1117/12.637967
Event: Microelectronics, MEMS, and Nanotechnology, 2005, Brisbane, Australia
Abstract
The explosive properties of porous-silicon, impregnated with an oxidant, were researched. The electrochemical etching of porous silicon layers was investigated, and a porous layer structural model is proposed to model the pore and crystallite dimensions of the porous layer. A gravimetric experimental technique is described whereby the pore dimensions and specific surface area can be determined. A new relationship between pore size and specific surface area was established. The types of oxidants and their properties, as well as the impregnation of the porous layers by different oxidants, were researched. It was observed that the filling of the pores by the oxidant is a function of pore diameter, specific surface area and type of oxidant used. The experimentally observed explosive properties are a function of silicon resistivity, porous layer porosity and pore dimensions. It was found that there is an optimum pore size for the most energetic explosion. Future applications for this new technology are proposed.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Monuko du Plessis and Corrie Conradie "Nano-explosions in porous silicon", Proc. SPIE 6037, Device and Process Technologies for Microelectronics, MEMS, and Photonics IV, 60370X (28 December 2005); https://doi.org/10.1117/12.637967
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CITATIONS
Cited by 5 scholarly publications and 1 patent.
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KEYWORDS
Silicon

Explosives

Crystals

Sulfur

Etching

3D modeling

Chemical analysis

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