High power and short pulse RF-excited CO<sub>2</sub> laser MOPA system for LLP EUV light source

Tatsuya Ariga; Hideo Hoshino; Taisuke Miura; Akira Endo

doi:10.1117/12.645607

23 February 2006 High power and short pulse RF-excited CO₂ laser MOPA system for LLP EUV light source

Tatsuya Ariga, Hideo Hoshino, Taisuke Miura, Akira Endo

Proceedings Volume 6101, Laser Beam Control and Applications; 61011N (2006) https://doi.org/10.1117/12.645607
Event: Lasers and Applications in Science and Engineering, 2006, San Jose, California, United States

Abstract

Laser produced plasma EUV source is the candidate for high quality, 115 W EUV light source for the next generation lithography. Cost effective laser driver is the key requirement for the realization of the concept as a viable scheme. A CO₂ laser driven LPP system with a Xenon droplet target is therefore a promising light source alternative for EUV. We are developing a high power and high repetition rate CO₂ laser system to achieve 10 W intermediate focus EUV power. High conversion efficiency (CE) from the laser energy to EUV in-band energy is the primarily important issue for the concept to be realized. Numerical simulation analysis of a Xenon plasma target shows that a short laser pulse less than 15 ns is necessary to obtain a high CE by a CO₂ laser. This paper describes on the development of a CO₂ laser system with a short pulse length less than 15 ns, a nominal average power of a few kW, and a repetition rate of 100 kHz, based on RF-excited, axial flow CO₂ laser amplifiers. Output power of 1 kW has been achieved with a pulse length 15 ns at 100 kHz repletion rate in a small signal amplification condition with P(20) single line. The CO₂ laser system is reported on the conceptual design for a LPP EUV light source, and amplification performance in CW and short pulse using RF-excited axial flow lasers as amplifiers. Additional approach to increase the amplification efficiency is discussed.

Citation Download Citation

Tatsuya Ariga, Hideo Hoshino, Taisuke Miura, and Akira Endo "High power and short pulse RF-excited CO₂ laser MOPA system for LLP EUV light source", Proc. SPIE 6101, Laser Beam Control and Applications, 61011N (23 February 2006); https://doi.org/10.1117/12.645607

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