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1 March 2006 Femtosecond laser lithography and applications
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Abstract
Rapid progress in ultrafast laser systems opened many exciting possibilities for high-resolution material processing. These laser systems allow to control and deliver optical energy and laser pulses in time and space with unprecedented precision. It is not surprising that these high-quality optical pulses have revolutionized microfabrication technologies. Femtosecond lasers enabled processing of a wide range of materials (including heat sensitive and thermo reactive) with a sub-micrometer resolution. At present, nearly arbitrary shaped 2D and 3D structures can be produced by direct write photofabrication techniques using femtosecond laser pulses. In this paper we present a brief review of our recent progress in femtosecond (maskless, direct-write, nonlinear) laser lithography and 3D photofabrication technique.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B. N. Chichkov, E. Fadeeva, J. Koch, A. Ostendorf, A. Ovsianikov, S. Passinger, and C. Reinhardt "Femtosecond laser lithography and applications", Proc. SPIE 6106, Photon Processing in Microelectronics and Photonics V, 610612 (1 March 2006); https://doi.org/10.1117/12.651664
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