Grey scale electron-beam lithography in functionalized SU-8 for active optical devices

S. Balslev; T. Rasmussen; P. Shi; A. Kristensen

doi:10.1117/12.641213

23 January 2006 Grey scale electron-beam lithography in functionalized SU-8 for active optical devices

S. Balslev, T. Rasmussen, P. Shi, A. Kristensen

Proceedings Volume 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV; 61100C (2006) https://doi.org/10.1117/12.641213
Event: MOEMS-MEMS 2006 Micro and Nanofabrication, 2006, San Jose, California, United States

Abstract

Miniaturized, single mode polymer dye lasers are realized by means of grey scale electron beam lithography (EBL) in functionalized SU-8 2000 resist, doped with Rhodamine 6G laser dye. These devices offer the possibility of easy integration of single mode laser sources in polymer based lab-on-a-chip microsystems. The demonstrated laser device consists of a planar waveguide with a 1st-order distributed feedback grating (DFB) surface corrugation, which forms an optical resonator. When optically pumped at 532 nm, single mode lasing is obtained in the wavelength range 570 nm - 630 nm, determined by the grating period. Our results demonstrate the feasibility of fabricating advanced nano-structured active optical components in a rapid prototyping process.

Citation Download Citation

S. Balslev, T. Rasmussen, P. Shi, and A. Kristensen "Grey scale electron-beam lithography in functionalized SU-8 for active optical devices", Proc. SPIE 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV, 61100C (23 January 2006); https://doi.org/10.1117/12.641213

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