Paper
9 June 2006 Analysis and fabrication of a new two dimensional near infrared pincushion silicon based PSD
Xunjun Qi, Bin Lin, Lu Lu, Wei Jin, Xiangqun Cao
Author Affiliations +
Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61490I (2006) https://doi.org/10.1117/12.674205
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China
Abstract
A new photoelectric model of silicon based position sensitive detector (PSD) is built and the formulas of the photocurrent and spectral response are got with it. The effect of every layer thickness and SiO2 thickness to the spectral response is analysis and calculation. The spectral response of PSD is affected by the thickness of p layer mainly at short wavelength and by the thickness of the depletion layer mainly at long wavelength. With the results, a new silicon based near infrared two dimensional pincushion PSD is designed and fabricated. Some necessary tests show that the peak spectral sensitivity of our device is 0.626A/W at 920nm wavelength.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xunjun Qi, Bin Lin, Lu Lu, Wei Jin, and Xiangqun Cao "Analysis and fabrication of a new two dimensional near infrared pincushion silicon based PSD", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61490I (9 June 2006); https://doi.org/10.1117/12.674205
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KEYWORDS
Silicon

Near infrared

Diffusion

Electrodes

Electrons

Absorption

Photons

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