Development of CO<sub>2</sub> laser produced Xe plasma EUV light source for microlithography

Hakaru Mizoguchi; Akira Endo; Tatsuya Ariga; Taisuke Miura; Hideo Hoshino; Yoshifumi Ueno; Masaki Nakano; Hiroshi Komori; Akira Sumitani; Tamotsu Abe; Takashi Suganuma; Georg Soumagne; Hiroshi Someya; Yuichi Takabayashi; Koichi Toyoda

doi:10.1117/12.656941

23 March 2006 Development of CO₂ laser produced Xe plasma EUV light source for microlithography

Hakaru Mizoguchi, Akira Endo, Tatsuya Ariga, Taisuke Miura, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Hiroshi Komori, Akira Sumitani, Tamotsu Abe, Takashi Suganuma, Georg Soumagne, Hiroshi Someya, Yuichi Takabayashi, Koichi Toyoda

Author Affiliations +

Proceedings Volume 6151, Emerging Lithographic Technologies X; 61510S (2006) https://doi.org/10.1117/12.656941
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

A CO₂ laser driven Xe droplet plasma is presented as a light source for EUV lithography. A short-pulse TEA CO₂ master oscillator power amplifier system and a pre-pulse Nd:YAG laser were used for initial experiment with 0.6% of CE from a Xe jet. A target technology is developed for high average power experiments based on a Xe droplet at 100kHz. Magnetic field ion mitigation is shown to work well in the pre-pulsed plasma combined with a CO₂ laser main pulse. This result is very promising with respect to collector mirror lifetime extension by magnetic field mitigation. A master oscillator power amplifier (MOPA) CO₂ laser system is under development with a few kW and 100 kHz repetition rate with less than 15ns laser pulse width using a waveguide Q-switched CO₂ laser oscillator and RF-excited fast axial flow CO₂ laser amplifiers.

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Hakaru Mizoguchi, Akira Endo, Tatsuya Ariga, Taisuke Miura, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Hiroshi Komori, Akira Sumitani, Tamotsu Abe, Takashi Suganuma, Georg Soumagne, Hiroshi Someya, Yuichi Takabayashi, and Koichi Toyoda "Development of CO₂ laser produced Xe plasma EUV light source for microlithography", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510S (23 March 2006); https://doi.org/10.1117/12.656941

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