Thermal stress kinetics in the microresist–silicon system

S. Tamulevicius; V. Grigaliunas; D. Jucius; V. Ostasevicius; A. Palevicius; G. Janusas

doi:10.1117/12.659952

24 March 2006 Thermal stress kinetics in the microresist-silicon system

S. Tamulevicius, V. Grigaliunas, D. Jucius, V. Ostasevicius, A. Palevicius, G. Janusas

Proceedings Volume 6151, Emerging Lithographic Technologies X; 61512I (2006) https://doi.org/10.1117/12.659952
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

In this work we report stress kinetics of thermoplastic polymer mr-I 8020 on crystalline silicon during thermal exposure to the temperature ranges typically applied in the imprint experiment. Stress kinetics in the polymer-silicon structure was measured experimentally in-situ using a Michelson interferometer and controlling temperature of the structure by thermocouple. The changes of radius of curvature due to the thermal heating were measured by laser (λ=633nm) interferometer and corresponding stress was calculated using a Stoney formula. It is shown that within the temperatures below the polymer glassing temperatures elastic response of the polymer dominates for different time of heating and cooling.

Citation Download Citation

S. Tamulevicius, V. Grigaliunas, D. Jucius, V. Ostasevicius, A. Palevicius, and G. Janusas "Thermal stress kinetics in the microresist-silicon system", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61512I (24 March 2006); https://doi.org/10.1117/12.659952

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