Process influence study on optical model generation during model-based OPC development

ChinTeong Lim; Vlad Temchenko; Woong-Jae Chung; Dave Wallis; Robert Wildfeuer; Uta Mierau; Sebastian Schmidt; Martin Niehoff

doi:10.1117/12.655801

10 March 2006 Process influence study on optical model generation during model-based OPC development

ChinTeong Lim, Vlad Temchenko, Woong-Jae Chung, Dave Wallis, Robert Wildfeuer, Uta Mierau, Sebastian Schmidt, Martin Niehoff

Author Affiliations +

Proceedings Volume 6155, Data Analysis and Modeling for Process Control III; 615503 (2006) https://doi.org/10.1117/12.655801
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Optical & process model are used in conjunction with Mentors Calibre OPC tool to predict the behavior of a lithography process. Resist models rely exclusively on empirical measurement data, while optical models are calibrated based on the users knowledge of tool settings, but also fitting unknown parameters to empirical measurements. The final OPC model is a combination of optical & process behaviors prediction which includes resist & other process influence to meet the ever increasing demand of advanced lithography technology nodes like 90nm & below on model accuracy. Reliance of optical model creation on empirical measurement data is undoubtedly raising suspicion of how well the derived diffraction model is able to provide an accurate description of how light energy is distributed inside the resist. Various work & effort had been conducted in the past to cover defocus phenomenal on final model outcome & methodology introduced on better prediction from defocus to achieve better simulation quality, investigation has been carried out to study in further detail of existing strategy of resist & optical decoupling methodology in this work.

Citation Download Citation

ChinTeong Lim, Vlad Temchenko, Woong-Jae Chung, Dave Wallis, Robert Wildfeuer, Uta Mierau, Sebastian Schmidt, and Martin Niehoff "Process influence study on optical model generation during model-based OPC development", Proc. SPIE 6155, Data Analysis and Modeling for Process Control III, 615503 (10 March 2006); https://doi.org/10.1117/12.655801

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Data modeling

Calibration

Photoresist processing

Optical proximity correction

Process modeling

Optical calibration

Diffusion

Show All Keywords

Keywords/Phrases

Search In:

Publication Years