Hyper-NA model validation for the 45-nm node

Shane R. Palmer; Min Bai; Paul J. M. van Adrichem

doi:10.1117/12.656059

15 March 2006 Hyper-NA model validation for the 45-nm node

Shane R. Palmer, Min Bai, Paul J. M. van Adrichem

Proceedings Volume 6155, Data Analysis and Modeling for Process Control III; 615505 (2006) https://doi.org/10.1117/12.656059
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Over the years process development engineers found creative ways to extent the capabilities of existing imaging techniques to enable production of the next technology node. For the 45nm node the immersion technology is being prepared for production, along with other resolutions enhancement techniques such as illuminator polarization. In parallel with the development of these tools, modeling techniques are being developed, which are needed in order to establish the design flows and to set up the Optical Proximity Correction (OPC) and mask data preparation. There is a clear need to validate these models and verify them in an early stage. With the equipment not being available yet, other methods like Maxwell simulators and special test equipment are used for such validations. In this paper initial model verification and validation work is presented of a hyper NA models developed for the 45nm technology node. Models with different illuminator settings are used and compared with Maxwell simulators and experimental measurements obtained with an Exitech MS-193i immersion micro-exposure tool.

Citation Download Citation

Shane R. Palmer, Min Bai, and Paul J. M. van Adrichem "Hyper-NA model validation for the 45-nm node", Proc. SPIE 6155, Data Analysis and Modeling for Process Control III, 615505 (15 March 2006); https://doi.org/10.1117/12.656059

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