Matching poly-layer ADI and AEI process windows by using ADI index

Wenzhan Zhou; Zheng Zou; Alex See

doi:10.1117/12.650896

15 March 2006 Matching poly layer ADI and AEI process windows by using ADI index

Wenzhan Zhou, Zheng Zou, Alex See

Proceedings Volume 6155, Data Analysis and Modeling for Process Control III; 61550I (2006) https://doi.org/10.1117/12.650896
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

As the critical-dimension of IC devices shrinks to below 90nm, it becomes very important to find an approach to control AEI CD more efficiently. This is especially so for poly gate patterning where not only photoresist dimension but also the photoresist profile plays an important role in defining final CD due to the impact of the photoresist profile on the etch process. In this paper, we will introduce an ADI index, which includes both CD and profile information collected by scatterometry system (KLA-Tencor SCD). With this ADI index, we can match the ADI process window with the AEI process window (exposure and focus window), and final AEI CD can be accurately predicted. This approach can also be effectively used in feed-forward Advanced Process Control (APC) poly patterning.

Citation Download Citation

Wenzhan Zhou, Zheng Zou, and Alex See "Matching poly layer ADI and AEI process windows by using ADI index", Proc. SPIE 6155, Data Analysis and Modeling for Process Control III, 61550I (15 March 2006); https://doi.org/10.1117/12.650896

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