Silicon IP reuse standards for design for manufacturability

Juan Antonio Carballo; Savithri Sundareswaran

doi:10.1117/12.659829

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14 March 2006 Silicon IP reuse standards for design for manufacturability

Juan Antonio Carballo, Savithri Sundareswaran

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Proceedings Volume 6156, Design and Process Integration for Microelectronic Manufacturing IV; 615606 (2006) https://doi.org/10.1117/12.659829
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Design for Manufacturability (DFM) has become a major semiconductor topic that spans various issues, including issues related to lithography hardware limitations, and issues related to variability. There is, however, an issue that crosses multiple DFM domains: the need to reuse designed Silicon IP blocks or "cores" across various manufacturing processes. Unfortunately, there are no standards to facilitate the reuse of circuit blocks while addressing the lithography- and variability-related issues. Specifically, there is no clear definition for a user of a core to evaluate "manufacturability" of a core for a set of foundry processes. We present a quantitative DFM standard for Silicon IP reuse, which addresses this problem. This work was done in conjunction with VSIA's DFM team.

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Juan Antonio Carballo and Savithri Sundareswaran "Silicon IP reuse standards for design for manufacturability", Proc. SPIE 6156, Design and Process Integration for Microelectronic Manufacturing IV, 615606 (14 March 2006); https://doi.org/10.1117/12.659829

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