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21 April 2006 Integrating photonic and microfluidic structures on a device fabricated using proton beam writing
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Abstract
Proton beam writing is a lithographic technique that can be used to fabricate microstructures in a variety of materials including PMMA, SU-8 and FoturanTM. The technique utilizes a highly focused mega-electron volt beam of protons to direct write latent images into a material which are subsequently developed to form structures. Furthermore, the energetic protons can also be used to modify the refractive index of the material at a precise depth by using the end of range damage. In this paper we apply the proton beam writing technique to the fabrication of a lab-on-a-chip device that integrates buried waveguides with microfluidic channels. We have chosen to use FoturanTM photostructurable glass for the device because both direct patterning and refractive index modification is possible with MeV protons.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. A. Bettiol, E. J. Teo, C. N. B. Udalagama, S. Venugopal Rao, J. A. van Kan, P. G. Shao, and F. Watt "Integrating photonic and microfluidic structures on a device fabricated using proton beam writing", Proc. SPIE 6186, MEMS, MOEMS, and Micromachining II, 61860F (21 April 2006); https://doi.org/10.1117/12.662495
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