X-ray diffraction in optical microsystems technology

Giovanni Berti

doi:10.1117/12.662498

28 April 2006 X-ray diffraction in optical microsystems technology

Giovanni Berti

Proceedings Volume 6188, Optical Micro- and Nanometrology in Microsystems Technology; 61880X (2006) https://doi.org/10.1117/12.662498
Event: SPIE Photonics Europe, 2006, Strasbourg, France

Abstract

The present paper considers the use of X-Ray diffraction when applied for non destructive applications to surfaces with properties which are relevant for the qualification of the components of industrial plants or other related uses. The paper describes the most current worries related to calibration of diffractometers when they are used in laboratories; it introduces also a new approach to calculate the uncertainty of parameters related to the Bragg Equation. The approach implies to distinguish the Bragg angle from the effective angle occurring when settling a real experiment for x-ray diffraction measurements. Motivations are given for the introduction of such a new term. Moreover, based on recent networking experiences, a new conceptual approach to Round Robin test is given.

Citation Download Citation

Giovanni Berti "X-ray diffraction in optical microsystems technology", Proc. SPIE 6188, Optical Micro- and Nanometrology in Microsystems Technology, 61880X (28 April 2006); https://doi.org/10.1117/12.662498

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