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20 April 2006 Toward femtosecond laser lithography
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Abstract
Conventional lithography is a leading high-throughput patterning method for mass production. But the dramatically increasing cost of lithographic equipment and mask sets, which is a consequence of pushing optical lithography to its limits, makes alternative, maskless lithographic techniques attractive. Femtosecond lasers have been found suitable for processing of a wide range of materials with sub-micrometer resolution. The limit of achievable structure sizes is predicted to be below 100 nm. Therefore, it is attractive to use this technique for maskless lithography. In this paper, first results on super-resolution femtosecond laser lithography showing great potential for future applications are presented.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Koch, E. Fadeeva, A. Ostendorf, and B. N. Chichkov "Toward femtosecond laser lithography", Proc. SPIE 6195, Nanophotonics, 61950F (20 April 2006); https://doi.org/10.1117/12.660775
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