Paper
31 May 2006 Microprocessing with the assistance of copper vapor laser system
G. A. Azizbekian, G. V. Grigorian, M. A. Kazaryan, N. A. Lyabin, E. A. Morozova, L. A. Pogosyan, A. G. Tamanyan
Author Affiliations +
Proceedings Volume 6263, Atomic and Molecular Pulsed Lasers VI; 62630T (2006) https://doi.org/10.1117/12.677447
Event: Atomic and Molecular Pulsed Lasers VI, 2005, Tomsk, Russian Federation
Abstract
Laser processing of materials always was the important field for laser applications. Copper vapor laser (CVL) system are widely used in micromechanical engineering where optical system may provide high image quality. That allows us to concentrate the energy on a small surface and to produce very tiny holes and very thin cutting edges. The possibility to use "generator-amplifier" laser system (copper vapor elements LT-5Cu and LT-30Cu) for processing material without mechanical movements was investigated. As the pumping generator was used the scheme with the current pulse duration about 80 - 100 ns and the laser pulse duration may vary up to 25 ns. In the unstable resonator scheme the special plane mirror with reflecting coating was used. With the help of this system a number of materials were processed, namely: copper, stainless steel, gold, aluminum and nonmetals: sapphire, ceramics, various rocks, plastics etc.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. A. Azizbekian, G. V. Grigorian, M. A. Kazaryan, N. A. Lyabin, E. A. Morozova, L. A. Pogosyan, and A. G. Tamanyan "Microprocessing with the assistance of copper vapor laser system", Proc. SPIE 6263, Atomic and Molecular Pulsed Lasers VI, 62630T (31 May 2006); https://doi.org/10.1117/12.677447
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Copper vapor lasers

Laser processing

Copper

Laser applications

Laser systems engineering

Materials processing

Mirrors

RELATED CONTENT


Back to Top