The first full-field EUV masks ready for printing

Uwe Mickan; Rogier Groeneveld; Marcel Demarteau; Jan Hendrik Peters; Uwe Dersch; Günter Hess; Holger Seitz

doi:10.1117/12.692629

21 June 2006 The first full-field EUV masks ready for printing

Uwe Mickan, Rogier Groeneveld, Marcel Demarteau, Jan Hendrik Peters, Uwe Dersch, Günter Hess, Holger Seitz

Proceedings Volume 6281, 22nd European Mask and Lithography Conference; 628105 (2006) https://doi.org/10.1117/12.692629
Event: 22nd European Mask and Lithography Conference, 2006, Dresden, Germany

Abstract

ASML's first EUV alpha demo tool (ADT) is ready for lithographic set up, driving the need for qualified and fully compliant EUV masks. EUV reflection masks are different in blank and mask processes compared to current technologies e.g. masks for 193nm. Although in recent years individual EUV mask parameters have been demonstrated, it is only with the fabrication on the ADT mask set that fully compliant masks have been made. In this paper we discuss the typical requirements of a EUV full-field mask, and show first results from achieving the important milestone of fabricating EUV masks.

Citation Download Citation

Uwe Mickan, Rogier Groeneveld, Marcel Demarteau, Jan Hendrik Peters, Uwe Dersch, Günter Hess, and Holger Seitz "The first full-field EUV masks ready for printing", Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 628105 (21 June 2006); https://doi.org/10.1117/12.692629

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