Nanoimprint lithography techniques: an introduction

H.-C. Scheer

doi:10.1117/12.692648

21 June 2006 Nanoimprint lithography techniques: an introduction

H.-C. Scheer

Proceedings Volume 6281, 22nd European Mask and Lithography Conference; 62810N (2006) https://doi.org/10.1117/12.692648
Event: 22nd European Mask and Lithography Conference, 2006, Dresden, Germany

Abstract

The main nanoimprint lithography techniques are highlighted in this paper. In addition to details concerning the materials used and the basic processing techniques, some of the major recent developments are summarized. Critical issues are addressed and some ideas for improvement are given. The paper aims to give an introduction to the techniques and a survey of the actual status without going into the details of the specific techniques.

Citation Download Citation

H.-C. Scheer "Nanoimprint lithography techniques: an introduction", Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810N (21 June 2006); https://doi.org/10.1117/12.692648

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