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21 June 2006Nanoimprint lithography techniques: an introduction
The main nanoimprint lithography techniques are highlighted in this paper. In addition to details
concerning the materials used and the basic processing techniques, some of the major recent
developments are summarized. Critical issues are addressed and some ideas for improvement are
given. The paper aims to give an introduction to the techniques and a survey of the actual status
without going into the details of the specific techniques.
H.-C. Scheer
"Nanoimprint lithography techniques: an introduction", Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810N (21 June 2006); https://doi.org/10.1117/12.692648
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H.-C. Scheer, "Nanoimprint lithography techniques: an introduction," Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810N (21 June 2006); https://doi.org/10.1117/12.692648