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21 June 2006 Design for manufacturing validation tool: fast and reliable conversion of SEM images to GDS images
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Proceedings Volume 6281, 22nd European Mask and Lithography Conference; 62810Y (2006) https://doi.org/10.1117/12.692747
Event: 22nd European Mask and Lithography Conference, 2006, Dresden, Germany
Abstract
The ability to convert high resolution images from a Scanning Electron Microscope (SEM) of a printed lithographic pattern to a GDS image file which can be input into modeling software (such as litho-simulation, etc.) for rigorous analysis is a powerful tool. Its use can be expanded through the simplication of the SEM2GDS conversion procedure by automation of the tasks. In this paper, we describe our SEM2GDS and SCAN INTERFACE UNIT, which automates both SEM image collection and SEM2GDS conversion.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Ronning, D. Ducharme, R. Selzer, B. Boerger, M. Yu, B. Xing, M. Trybendis, and B. Grenon "Design for manufacturing validation tool: fast and reliable conversion of SEM images to GDS images", Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810Y (21 June 2006); https://doi.org/10.1117/12.692747
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