Paper
20 May 2006 Higher current density operation with EB reticle writer EBM-5000
Author Affiliations +
Abstract
The performance of electron beam reticle writer EBM-5000(NFT) was examined with higher current density. The current density was raised up to 70A/cm2 against to its standard current density 50A/cm2, and sufficiently good results were obtained with that operating condition. We concluded that the performance with that operating condition was good enough to produce photomasks for 65nm node devices.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masato Saito, Kunihiro Ugajin, Tomotaka Higaki, Hideaki Nishino, and Hidehiro Watanabe "Higher current density operation with EB reticle writer EBM-5000", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62831L (20 May 2006); https://doi.org/10.1117/12.681747
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Reticles

Statistical analysis

Optical simulations

Photomasks

Computer simulations

Photoresist processing

Darmstadtium

RELATED CONTENT

Comparison of DNQ/novolac resists for e-beam exposure
Proceedings of SPIE (December 30 1999)
Overview of SASE free-electron laser simulation codes
Proceedings of SPIE (July 19 1999)
Bilevel resist process for 1-Gb DRAM reticles
Proceedings of SPIE (July 24 1996)
MSB for ILT masks
Proceedings of SPIE (April 01 2011)

Back to Top