Influence of the pellicle on final photomask flatness

Richard Wistrom; Dennis Hayden; Kenneth Racette; Monica Barrett; Andrew Watts

doi:10.1117/12.681775

20 May 2006 Influence of the pellicle on final photomask flatness

Richard Wistrom, Dennis Hayden, Kenneth Racette, Monica Barrett, Andrew Watts

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 628326 (2006) https://doi.org/10.1117/12.681775
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

Photomask pellicles play an important role in determining final photomask flatness, which is important to photomask optical performance. This study explores the impact of the pellicle frame flatness and pellicle-to-mask adhesive on photomask flatness. In addition, the change in mask flatness as a function of time after pellicle mounting is studied. Implications of these results on photomask manufacture and photolithography are discussed.

Citation Download Citation

Richard Wistrom, Dennis Hayden, Kenneth Racette, Monica Barrett, and Andrew Watts "Influence of the pellicle on final photomask flatness", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 628326 (20 May 2006); https://doi.org/10.1117/12.681775

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available