Desire : A Novel Dry Developed Resist System

Fedor Coopmans; Bruno Roland

doi:10.1117/12.963623

9 July 1986 Desire : A Novel Dry Developed Resist System

Fedor Coopmans, Bruno Roland

Proceedings Volume 0631, Advances in Resist Technology and Processing III; (1986) https://doi.org/10.1117/12.963623
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

We introduce the DESIRE system, a noval approach to dry developed resist systems. DESIRE is a single layer system based on selective silylation. The optical spatial information is translated into silicon being built into the resin during the silylation treatment. A negative working version will be discussed. The process flow is given and a set of results showing submicron dimensions with high aspect ratio and good linewidth control are presented. The excellent features of the system make it a possible candidate for use in submicron applications with UV exposure tools.

Citation Download Citation

Fedor Coopmans and Bruno Roland "Desire : A Novel Dry Developed Resist System", Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); https://doi.org/10.1117/12.963623

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