2D photonic crystal patterning for high-volume LED manufacturing

Rob Hershey; Mike Miller; Chris Jones; Mahadevan Ganapathi Subramanian; Xiaoming Lu; Gary Doyle; David Lentz; Dwayne LaBrake

doi:10.1117/12.681481

12 September 2006 2D photonic crystal patterning for high-volume LED manufacturing

Rob Hershey, Mike Miller, Chris Jones, Mahadevan Ganapathi Subramanian, Xiaoming Lu, Gary Doyle, David Lentz, Dwayne LaBrake

Author Affiliations +

Proceedings Volume 6337, Sixth International Conference on Solid State Lighting; 63370M (2006) https://doi.org/10.1117/12.681481
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

Due to their small dimensions when used for visible light, the patterning of photonic crystals has only been possible with costly electron beam lithography and low throughput R&D and pilot production grade imprint lithography. This paper will focus on results from a high throughput imprint tool capable of processing over 20 wafers per hour on 50- 100mm sapphire, GaAs, SiC, Ge and metal substrates. An overview of the process used as well as the results of patterning photonic crystal patterns on sapphire wafers and etching them into a SiO2 hard mask will be presented. Finally an analysis of the cost of ownership which currently stands at ~ $20/wf (<$0.01/mm² for 50mm wafers) will be presented and opportunities for improvement discussed.

Citation Download Citation

Rob Hershey, Mike Miller, Chris Jones, Mahadevan Ganapathi Subramanian, Xiaoming Lu, Gary Doyle, David Lentz, and Dwayne LaBrake "2D photonic crystal patterning for high-volume LED manufacturing", Proc. SPIE 6337, Sixth International Conference on Solid State Lighting, 63370M (12 September 2006); https://doi.org/10.1117/12.681481

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