Excimer-laser-driven EUV plasma source for one-shot one-pattern projection microlithography

P. Di Lazzaro; G. Altieri; D. Amodio; S. Bollanti; A. Conti; F. Flora; T. Letardi; L. Mezi; D. Murra; E. Tefouet Kana; A. Torre; C. E. Zheng

doi:10.1117/12.738084

26 April 2007 Excimer-laser-driven EUV plasma source for one-shot one-pattern projection microlithography

P. Di Lazzaro, G. Altieri, D. Amodio, S. Bollanti, A. Conti, F. Flora, T. Letardi, L. Mezi, D. Murra, E. Tefouet Kana, A. Torre, C. E. Zheng

Author Affiliations +

Proceedings Volume 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; 63460M (2007) https://doi.org/10.1117/12.738084
Event: XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2006, Gmunden, Austria

Abstract

We present the design elements and the preliminary experimental results of an Extreme-UltraViolet (EUV) exposure tool driven by the high-output-energy excimer laser-facility Hercules, which is aimed at printing a sub-100-nm-pattern on a photoresist in a single-shot irradiation.

Citation Download Citation

P. Di Lazzaro, G. Altieri, D. Amodio, S. Bollanti, A. Conti, F. Flora, T. Letardi, L. Mezi, D. Murra, E. Tefouet Kana, A. Torre, and C. E. Zheng "Excimer-laser-driven EUV plasma source for one-shot one-pattern projection microlithography", Proc. SPIE 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 63460M (26 April 2007); https://doi.org/10.1117/12.738084

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