Paper
26 April 2007 Enhancement of extreme ultraviolet emission from a lithium plasma by use of dual laser pulses
Takeshi Higashiguchi, Keita Kawasaki, Yusuke Senba, Sumihiro Suetake, Masahito Katto, Shoichi Kubodera
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Proceedings Volume 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; 63462R (2007) https://doi.org/10.1117/12.739115
Event: XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2006, Gmunden, Austria
Abstract
We demonstrated enhancement of extreme ultraviolet (EUV) emission at 13.5 nm from a lithium plasma by use of dual laser pulses. A single laser pulse produced a lithium plasma condition for the EUV emission far beyond its optimum. Utilization of dual laser pulses, however, enhanced the EUV emission energy, and its maximum in-band EUV conversion efficiency (CE) in a measured solid angle was observed to be 2% at a delay time between 20 and 50 ns.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takeshi Higashiguchi, Keita Kawasaki, Yusuke Senba, Sumihiro Suetake, Masahito Katto, and Shoichi Kubodera "Enhancement of extreme ultraviolet emission from a lithium plasma by use of dual laser pulses", Proc. SPIE 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 63462R (26 April 2007); https://doi.org/10.1117/12.739115
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KEYWORDS
Extreme ultraviolet

Plasma

Lithium

Pulsed laser operation

Ions

Coded apertures

Mirrors

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