You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.
20 October 2006Design-based mask metrology hot spot classification and recipe making through random pattern recognition method
Design Based Metrology (DBM) requires an integrated process from design to metrology, and the very first and key
step of this integration is to translate design CD lists to metrology measurement recipes. Design CD lists can come from
different sources, such as design rule check, OPC validation, or yield analysis. These design CD lists can not be directly
used to create metrology tool recipes, since tool recipe makers usually require specific information of each CD site, or a
measurement matrix. The manual process to identify measurement matrix for each design CD site can be very difficult,
especially when the list is in hundreds or more. This paper will address this issue and propose a method to automate
Design CD Identification (DCDI), using a new CD Pattern Vector (CDPV) library.
The alert did not successfully save. Please try again later.
Ying Cui, Kiho Baik, Bob Gleason, Malahat Tavassoli, "Design-based mask metrology hot spot classification and recipe making through random pattern recognition method," Proc. SPIE 6349, Photomask Technology 2006, 63490O (20 October 2006); https://doi.org/10.1117/12.690988