Managing high-accuracy and fast convergence in OPC

Klaus Herold; Norman Chen; Ian P. Stobert

doi:10.1117/12.686725

20 October 2006 Managing high-accuracy and fast convergence in OPC

Klaus Herold, Norman Chen, Ian P. Stobert

Proceedings Volume 6349, Photomask Technology 2006; 634924 (2006) https://doi.org/10.1117/12.686725
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

The transition to the 65nm technology node requires improved methodologies for model based optical proximity correction. The approaches used for previous generations might not be able to deliver the high accuracy which is necessary for gate patterning on high performance or low leakage circuits. A new categorization scheme for OPC fragments will be introduced, which then allows independent optimization for various OPC tool parameters. The feasibility of this technique will be demonstrated by quantifying the OPC convergence through iterations, which emphasizes the performance gain in OPC accuracy and runtime.

Citation Download Citation

Klaus Herold, Norman Chen, and Ian P. Stobert "Managing high-accuracy and fast convergence in OPC", Proc. SPIE 6349, Photomask Technology 2006, 634924 (20 October 2006); https://doi.org/10.1117/12.686725

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