Benchmarking the productivity of photomask manufacturers

C. Neil Berglund; Charles M. Weber; Patricia Gabella

doi:10.1117/12.686227

20 October 2006 Benchmarking the productivity of photomask manufacturers

C. Neil Berglund, Charles M. Weber, Patricia Gabella

Proceedings Volume 6349, Photomask Technology 2006; 634927 (2006) https://doi.org/10.1117/12.686227
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

A survey-based, empirical study that benchmarks the productivity of photomask manufacturers has led to some significant conclusions. Firstly, the wide variation in the productivity indicators from company to company suggests that all participants may have significant cost-reduction opportunities within their operations. Secondly, the high downtime of pattern generation tools is limiting productivity. Thirdly, producing smaller feature sizes is correlated to an investment in engineering and experimentation capacity. It could not be confirmed that photomask manufacturers are successfully taking advantage of economies of scale.

Citation Download Citation

C. Neil Berglund, Charles M. Weber, and Patricia Gabella "Benchmarking the productivity of photomask manufacturers", Proc. SPIE 6349, Photomask Technology 2006, 634927 (20 October 2006); https://doi.org/10.1117/12.686227

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available