A new criterion of mask birefringence for polarized illumination

Kazuya Iwase; Boontarika Thunnakart; Tokihisa Kaneguchi; Ken Ozawa; Toshifumi Yokoyama; Yasutaka Morikawa; Fumikatsu Uesawa

doi:10.1117/12.685360

20 October 2006 A new criterion of mask birefringence for polarized illumination

Kazuya Iwase, Boontarika Thunnakart, Tokihisa Kaneguchi, Ken Ozawa, Toshifumi Yokoyama, Yasutaka Morikawa, Fumikatsu Uesawa

Author Affiliations +

Proceedings Volume 6349, Photomask Technology 2006; 634951 (2006) https://doi.org/10.1117/12.685360
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

We propose a new criterion for mask birefringence in polarized illumination. Mask birefringence is one of the critical properties of polarized illumination, because the illumination polarization is disturbed by the birefringence of a mask substrate. From this point of view, the allowable mask birefringence has already been analyzed. In these analyses, only the absolute values of birefringence have been specified. As has been pointed out, the mask is a rotation retarder for the polarized illumination. Therefore, the angle of the fast axis of mask birefringence also affects the state of polarization. The new criterion of mask birefringence which we propose here adopts the angle of fast axis as well as the absolute value of birefringence. This new criterion correlates well with the printed critical dimensions (CDs). To demonstrate this, printed CDs were calculated as a function of birefringence. A lithography simulator was used to verify the fit of the new criterion. In this simulation, experimentally measured absolute values of birefringence and the angle of fast axis were used. The simulation showed that there was poor correlation between printed CDs and the absolute values of birefringence. On the other hand, the new criterion exhibited a good correlation with the printed CDs. This difference is attributed to the effect of the angle of fast axis.

Citation Download Citation

Kazuya Iwase, Boontarika Thunnakart, Tokihisa Kaneguchi, Ken Ozawa, Toshifumi Yokoyama, Yasutaka Morikawa, and Fumikatsu Uesawa "A new criterion of mask birefringence for polarized illumination", Proc. SPIE 6349, Photomask Technology 2006, 634951 (20 October 2006); https://doi.org/10.1117/12.685360

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available