Effects of Ti addiction in WO3 thin film ammonia gas sensor prepared by dc reactive magnetron sputtering

Ming Hu; Cholyun Yong; Youcai Feng; Yuqiang Lv; Lei Han; Jiran Liang; Haopeng Wang

doi:10.1117/12.717784

28 October 2006 Effects of Ti addiction in WO₃ thin film ammonia gas sensor prepared by dc reactive magnetron sputtering

Ming Hu, Cholyun Yong, Youcai Feng, Yuqiang Lv, Lei Han, Jiran Liang, Haopeng Wang

Author Affiliations +

Proceedings Volume 6358, Sixth International Symposium on Instrumentation and Control Technology: Sensors, Automatic Measurement, Control, and Computer Simulation; 635810 (2006) https://doi.org/10.1117/12.717784
Event: Sixth International Symposium on Instrumentation and Control Technology, 2006, Beijing, China

Abstract

WO₃ sensing films (1500 Å) were deposited using dc reactive magnetron sputtering method on alumina substrate on which patterned interdigital Pt electrodes were previously formed. The additive Ti was sputtered with different thickness (100-500 Å) onto WO₃ thin films and then the films as-deposited were annealed at 400°C in air for 3h. The crystal structure and chemical composition of the films were characterized by XRD and XPS analysis. The effect of Ti addition on sensitive properties of WO₃ thin film to the NH₃ gas was then discussed. WO₃ thin films added Ti revealed excellent sensitivity and response characteristics in the presence of low concentration of NH₃ (5-400 ppm) gas in air at 200°C operating temperature. Especially,in case 300 Å thickness of additive Ti, WO₃ thin films have a promotional effect on the response speed to NH₃ and selectivity enhanced with respect to other gases (CO, C₂H₅OH, CH₄). The influence of different substrates, including alumina, silicon and glass, on sensitivity to NH₃ gas has also been investigated.

Citation Download Citation

Ming Hu, Cholyun Yong, Youcai Feng, Yuqiang Lv, Lei Han, Jiran Liang, and Haopeng Wang "Effects of Ti addiction in WO₃ thin film ammonia gas sensor prepared by dc reactive magnetron sputtering", Proc. SPIE 6358, Sixth International Symposium on Instrumentation and Control Technology: Sensors, Automatic Measurement, Control, and Computer Simulation, 635810 (28 October 2006); https://doi.org/10.1117/12.717784

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