Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition

Shinji Matsui

doi:10.1117/12.690807

19 October 2006 Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition

Shinji Matsui

Proceedings Volume 6376, Optomechatronic Micro/Nano Devices and Components II; 637602 (2006) https://doi.org/10.1117/12.690807
Event: Optics East 2006, 2006, Boston, Massachusetts, United States

Abstract

Three-dimensional nanostructure fabrication has been demonstrated by 30 keV Ga⁺ focused-ion-beam chemical-vapor-deposition (FIB-CVD) using a phenanthrene (C₁₄H₁₀) source as a precursor. Microstructure plastic arts is advocated as a new field using micro-beam technology, presenting one example of micro-wine-glass with 2.75μm external diameter and 12μm height. The deposition film is a diamondlike amorphous carbon. A large Young's modulus that exceeds 600 GPa seems to present great possibilities for various applications. Producing of three-dimensional nanostructure is discussed. Micro-coil, nanoelectrostatic actuator, and nano-space-wiring with 0.1μm dimension are demonstrated as parts of nanomechanical system. Furthermore, nanoinjector and nanomanipulator are also fabricated as a novel nano-tool for manipulation and analysis of subcellular organelles.

Citation Download Citation

Shinji Matsui "Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition", Proc. SPIE 6376, Optomechatronic Micro/Nano Devices and Components II, 637602 (19 October 2006); https://doi.org/10.1117/12.690807

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