A comparison of wavelet multiresolution analysis and scale-space edge detection for lithography metrology

Yoshihiro Midoh; Koji Nakamae; Hiromu Fujioka

doi:10.1117/12.685872

12 October 2006 A comparison of wavelet multiresolution analysis and scale-space edge detection for lithography metrology

Yoshihiro Midoh, Koji Nakamae, Hiromu Fujioka

Author Affiliations +

Proceedings Volume 6383, Wavelet Applications in Industrial Processing IV; 63830H (2006) https://doi.org/10.1117/12.685872
Event: Optics East 2006, 2006, Boston, Massachusetts, United States

Abstract

We compared performance between the wavelet multiscale edge detection and the scale-space edge detection methods for lithography metrology. First, in order to determine a suitable wavelet, we evaluated the edge detection performance of the wavelet multiscale edge detection method with various types of wavelet families where a modeled SE signal of photoresist with shot noise was used. From the measurement results of average line widths and line edge roughnesses (LERs), the first-order derivative Gaussian wavelet was determined to be the suitable one for the measurement from SE signals of photoresist. Next, the performances were compared. As to the LER measurement, the difference between the two methods was little. However, for average line widths, the wavelet multiscale edge detection method had better performance than the scale-space edge detection method when SNR was lower than 5. Lastly, we applied the two methods to a noisy SEM image of photoresist. The wavelet multiscale edge detection method gave almost the same line width roughness as that of the scale-space edge detection method, though the former took a longer processing time. By setting the wavelet scale space properly, the processing time can be reduced.

Citation Download Citation

Yoshihiro Midoh, Koji Nakamae, and Hiromu Fujioka "A comparison of wavelet multiresolution analysis and scale-space edge detection for lithography metrology", Proc. SPIE 6383, Wavelet Applications in Industrial Processing IV, 63830H (12 October 2006); https://doi.org/10.1117/12.685872

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Wavelets

Edge detection

Line edge roughness

Scanning electron microscopy

Photoresist materials

Line width roughness

Metrology

Show All Keywords

Keywords/Phrases

Search In:

Publication Years