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20 December 2006 Nanosphere lithography using thermal evaporation of gold
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Nanosphere lithography, which allows for the fabrication of patterned metal surfaces, is a simple, effective and unconventional technique that exploits a self-assembly process. Using this technique, polystyrene nanospheres with diameters of 500nm, and 100nm were assembled onto a 'muscovite' mica substrate in a hexagonally close packed monolayer array, to provide a physical mask for material deposition. Thermal evaporation was subsequently used to deposit gold through the nanosphere mask layer, to generate a periodic array of gold nanostructures. Upon changing the mask to a multi-layered array of nanospheres, slightly more complex nanostructures were achieved. However due to thermal evaporation being a high temperature process the nanostructures obtained deviated from their predicted quasi triangular shape due to a slight annealing of the polystyrene mask.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B. S. Flavel, J. G. Shapter, and J. S. Quinton "Nanosphere lithography using thermal evaporation of gold", Proc. SPIE 6415, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems III, 64151J (20 December 2006);

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