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7 March 2007 Pulse-width dependency of the fabricating resolution of the two-photon absorption photo-polymerization
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Abstract
As an ultrafast laser has recently been developed, this leads to the innovative nanotechnology, the 3-D fabrication of the two-photon absorbed (TPA) photo-polymerization. The 3-D micro/nano structure by this method has a resolution of sub-hundred nm which is much smaller than the diffraction limit. Usually the 3-D polymer micro/nano structure by this method is made by stacking many of a unit polymer structure, so called 'voxel'. The size of the voxel is considered as the fabrication resolution. The size of a voxel, or the fabricating resolution is determined by several fabricating conditions such as the laser output power, the exposure time, the N.A. of the focusing lens, the types of polymerizing material, and the pulse-width. The voxel size due to power, exposure time and NA has been done by many research groups. Although the pulse-width is a very important condition for two-photon absorption, the study of influence on fabricating resolution by the pulse-width has not been done before. Therefore we studied the voxel size under the condition of increasing the pulse-width of the laser. To stretch the pulse-width, a single mode fiber (SMF) has been used. We demonstrated that the voxel lateral size decreased as pulse-width stretched to several picoseconds.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hong Jin Kong, Shin Wook Yi, Dong-Yol Yang, Kwang-Sup Lee, Jin-Baek Kim, Tae-woo Lim, and Sumin Kim "Pulse-width dependency of the fabricating resolution of the two-photon absorption photo-polymerization", Proc. SPIE 6462, Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII, 646202 (7 March 2007); https://doi.org/10.1117/12.701393
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